Electronic Thermostatic Chamber RT-250Z 430-GE
It realized precious temperature control by the Peltier method.
Deposition control in microns is required for the deposition process performed in semiconductor manufacturing. Temperature control of diffusion gas is also an important item in the vapor pressure control of the diffusion gas to be deposited.
Our electronic thermostatic chamber realizes the temperature control in one hundreds, and we have many achievements in the vapor deposition process.
In addition, it is effective for various applications that require delicate temperature control such as physics and chemistry field, pharmaceutical field and other fields.
・Temperature control of the liquid inside the tank in the range of -10.00 to 70.00 ° C by the partier cooling method.
・High temperature resolution at 0.01 ° C (1/100 ° C)
・High temperature stability (± 0.02 ° C) is realized by our original liquid circulation method.
・Highly accurate temperature controller developed.
・Separated design of the controller and tank
It is suitable for equipping in the systems.
・Communication function RS-232C / RS-485 (option)
In addition to temperature setting, monitoring of operation status, operation / stopping can also be controlled remotely.
Concentrated control is available for multiply equipped in CVD system.
|control method||Water-cooled electronic cooling system (Peltier method)|
|preset temperature range||-10.00〜70.00℃|
|Temperature indication / setting resolution||0.01℃|
|The above condition||Ambient temperature 23℃
Ambient humidity 55％RH
Coolant temperature 25℃
Liquid medium GALDEN HT200 ※2
No thermal load inside the tank.
|Communication function (option)||RS-232C/RS-485
Remote operation is also possible for driving / stopping, operation monitor, temperature setting and etc.
|Operating ambient temperature||5〜35℃|
|Cooling water flow rate||2.5～5.0L/min（Adjustable by setting temperature）|
|Power supply||Single phase AC200V 4A 50/60Hz
200 VAC 4A 50/60Hz
|Usable liquid medium||Fluorine-based medium
|Various protect function||Self-diagnosis function
Error / alarm output (relay output)
|Inner tank dimension (mm)||Ø250×430H（Liquid surface 400H）
|Outer tank dimension (mm)||321W×321D×580H（Except protrusion）|
|Control part external dimensions (mm)||260W×362D×147H（Except protrusion）|
Re.1) Including temperature distribution (measured value, not guaranteed value) It may vary depending on ambient temperature and cooling water temperature.
Re.2) GALDENR® is a registered trademark of Solveis Lexis Corporation
・Diffusion gas vapor pressure control of vapor deposition process performed in semiconductor manufacturing.
・Various experiments in the field of physics and chemistry.
・Examination research in the pharmaceutical field.
・Immersion temperature examination with inert liquid medium (GALDEN® etc.)